Research topics

  1. One-dimensional effects in metallic atomic chains on vicinal Si(111) surfaces.
  2. Electrical transport in metallic nanostructures.
  3. Quantum Size Effects (QSE) and quantum states in metallic Quantum Wells (QW).
  4. Metal induced Si surface reconstruction and nanostructures selfassembling processes.

Eperimental methods

  1. Scanning Tunneling Microscopy (STM) and Scanning Tunneling Spectroscopy (STS).
  2. Reflection High Electron Energy Diffraction (RHEED).
  3. Si surface with nanostructures electrical conductivity.
  4. Angle and Spin Resolved Photoelectron Spectroscopy (ARPES, SARPES).
  5. Differential Reflectance Spectroscopy (DRS)

Theoretical methods

  1. Ab-initio numerical calculations within Density Functional Theory (DFT) model.
  2. Metallic nanostructures electron energy and electron band structure calculations within Tight Binding (TB) theory.

Nanostructures and metallic quantum wells are grown in an UHV (Ultra High Vacuum) conditions by atom vapor deposition with help of selfassembling and epitaxy processes on atomically clean, well oriented crystalline Si surfaces. Metallic atomic chains are produced on vicinal Si surfaces.

Electrical conductivity of metallic quantum wells is since long time our research topic. Our laboratory is one of few in the world where galvanomagnetic properties of the metallic quantum wells are studied. Measurements are performed in UHV environment at low temperatures starting from about 3K. 

To study details of electron band structure of surface nanostructures we use electron photoemission (ARPES) methods. The UHV MICROPROBE (OMICRON) system is equipped with UV lamp (SPECS) capable producing of intense polarized light with quanta energy of 21.2 eV. Electron energy and momentum distribution is measured with hemispherical analyzer PHOIBOS 150 (SPECS) with a micro-channel plate (MCP) detector. Attached Mott detector allows performing spin-resolved photoemission measurements.

Crystal surface structure and its reconstructions upon sub-monolayer metal deposition are investigated with STM and RHEED techniques. The microscope allows performing measurements of the sample kept from helium temperatures up to several hundreds K. Atomic resolution of the microscope allows trace single atoms and the STM spectroscopic working mode gives insight into electronic nature of the sample. The STM VT (OMICRON) together with RHEED apparatus form powerful instrument for study of electronic and structural properties of nanostructures.

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